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Impact of EUV light scatter on CD control as a result of mask density changesKRAUTSCHIK, Christof; ITO, Masaaki; NISHIYAMA, Iwao et al.SPIE proceedings series. 2002, pp 289-301, isbn 0-8194-4434-0, 2VolConference Paper

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Step and Flash Imprint Lithography for Semiconductor High Volume Manufacturing?MALLOY, M; LITT, L. C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763706.1-763706.11Conference Paper

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Approaches to rapid resist spreading on dispensing based UV-NILUSUKI, Kazuyuki; WAKAMATSU, Satoshi; OOMATSU, Tadashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700S.1-79700S.8Conference Paper

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